Conformal Growth of Hexagonal Boron Nitride on High-Aspect-Ratio Silicon-Based Nanotrenches

نویسندگان

چکیده

We successfully accomplished the conformal growth of sp2-hybridized few-layer h-BN over an array Si-based nanotrenches with a 45 nm pitch and aspect ratio ?7:1 by using pulsed-mode metal–organic chemical vapor deposition (MOCVD) method. Surface-sensitive X-ray absorption fine structure spectroscopy density functional theory calculations revealed that B–O bonds formed on noncatalytic SiO2 surface act as nucleation sites for subsequential formation mixed sp2- sp3-hybridized BON2 BN3 at very initial stage injection MOCVD precursors, enabling excellent step coverage. believe these results can provide broad avenue implementation fascinating two-dimensional layered materials current state-of-the-art three-dimensional nanoscale architectures, overcoming downscaling limits.

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ژورنال

عنوان ژورنال: Chemistry of Materials

سال: 2023

ISSN: ['1520-5002', '0897-4756']

DOI: https://doi.org/10.1021/acs.chemmater.2c03568